We study thermally, electrically or optically induced surface and near-surface atomic motions in nanometer-thin films and film structures at relatively low temperatures (300–500 K). It is known that atomic motion processes in surface layers significantly modify the physical parameters of nanoscale systems, which is particularly important in the modern electronics industry. We prepare various metal and oxide layers by physical and chemical methods and use nanometer-resolution depth profile analysis, electron spectroscopic methods and scanning probe microscopy for studying surface atomic motions and charge distributions.